Electrical and Photoelectric Properties of Iron/Chromium Oxide Nanolayers Composite Structures

We report here results of our investigation of oxide nanometric films integrated with silicon substrates for new multifunctional applications. Ultraviolet photons of KrF-laser (248 nm) was used for the synthesis of nanometeric films based on iron and chromium oxides (Fe2O3–X(0 ≤ x ≤ 1) and Cr3−xO3−y(0 ≤ x ≤ 2; 0 ≤ y ≤ 2)) with variable thickness, stoichiometry and electrical properties. X-ray photoelectron spectroscopy was used for nanometric films characterization. The roughness value of the samples investigated shows a good quality of the finishing characteristics of films synthesized by the reactive pulsed laser deposition technique. Investigation of the charge carriers’ transport kinetics was carried out by surface photovoltage (SPV) and impedance spectroscopy technique. It was found that effect of the iron and chromium oxide layers’ combination results in the photovoltage enhancement of 500 times in the spectral region between 600 and 1150 nm. The effect of the long-term relaxation of the photovoltage was revealed also.