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Sub-nanometer resolution XPS depth profiling : Sensing of atoms

Autor
Roberts, Adam J
Macak, Karol
Hutton, Simon
Takahashi, Kazuhiro
Blomfield, Christopher
Szklarczyk, Marek
Głaszczka, Rafał
Data publikacji
2017
Abstrakt (EN)

The development of a method capable of distinguishing a single atom in a single molecule is important in many fields. The results reported herein demonstrate sub-nanometer resolution for angularly resolved X-ray photoelectron spectroscopy (ARXPS). This is made possible by the incorporation of a Maximum Entropy Method (MEM) model, which utilize density corrected electronic emission factors to the X-ray photoelectron spectroscopy (XPS) experimental results. In this paper we report on the comparison between experimental ARXPS results and reconstructed for both inorganic and organic thin film samples. Unexpected deviations between experimental data and calculated points are explained by the inaccuracy of the constants and standards used for the calculation, e.g. emission factors, scattering intensity and atomic density through the studied thickness.n The positions of iron, nitrogen and fluorine atoms were determined in the molecules of the studied self-assembled monolayers. It has been shown that reconstruction of real spectroscopic data with 0.2 nm resolution is possible.

Słowa kluczowe EN
XPS
ARXPS
Maximum Entropy Method
Sub-nanometer resolution
Nano films
Dyscyplina PBN
nauki chemiczne
Czasopismo
Applied Surface Science
Tom
411
Strony od-do
386-393
ISSN
0169-4332
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