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CC-BY - Uznanie autorstwaMacroscopic Alignment of Block Copolymers on Silicon Substrates by Laser Annealing
| cris.lastimport.scopus | 2024-02-12T20:26:34Z |
| dc.abstract.en | Laser annealing is a competitive alternative to conventional oven annealing of block copolymer (BCP) thin films enabling rapid acceleration and precise spatial control of the self-assembly process. Localized heating by a moving laser beam (zone annealing), taking advantage of steep temperature gradients, can additionally yield aligned morphologies. In its original implementation it was limited to specialized germanium-coated glass substrates, which absorb visible light and exhibit low-enough thermal conductivity to facilitate heating at relatively low irradiation power density. Here, we demonstrate a recent advance in laser zone annealing, which utilizes a powerful fiber-coupled near-IR laser source allowing rapid BCP annealing over a large area on conventional silicon wafers. The annealing coupled with photothermal shearing yields macroscopically aligned BCP films, which are used as templates for patterning metallic nanowires. We also report a facile method of transferring laser-annealed BCP films onto arbitrary surfaces. The transfer process allows patterning substrates with a highly corrugated surface and single-step rapid fabrication of multilayered nanomaterials with complex morphologies. |
| dc.affiliation | Uniwersytet Warszawski |
| dc.contributor.author | Majewski, Paweł |
| dc.contributor.author | Sitkiewicz, Andrzej |
| dc.contributor.author | Leniart, Arkadiusz Adam |
| dc.contributor.author | Puła, Przemysław |
| dc.date.accessioned | 2024-01-25T05:30:38Z |
| dc.date.available | 2024-01-25T05:30:38Z |
| dc.date.copyright | 2020-03-11 |
| dc.date.issued | 2020 |
| dc.description.accesstime | AT_PUBLICATION |
| dc.description.finance | Publikacja bezkosztowa |
| dc.description.number | 4 |
| dc.description.version | FINAL_PUBLISHED |
| dc.description.volume | 14 |
| dc.identifier.doi | 10.1021/ACSNANO.0C00696 |
| dc.identifier.issn | 1936-0851 |
| dc.identifier.uri | https://repozytorium.uw.edu.pl//handle/item/111650 |
| dc.language | eng |
| dc.pbn.affiliation | chemical sciences |
| dc.relation.ispartof | ACS Nano |
| dc.relation.pages | 4805-4815 |
| dc.rights | CC-BY |
| dc.sciencecloud | nosend |
| dc.subject.en | block copolymers |
| dc.subject.en | laser annealing |
| dc.subject.en | directed self-assembly |
| dc.subject.en | multilayers |
| dc.subject.en | nanopatterning |
| dc.subject.en | photothermal processing |
| dc.title | Macroscopic Alignment of Block Copolymers on Silicon Substrates by Laser Annealing |
| dc.type | JournalArticle |
| dspace.entity.type | Publication |