Artykuł w czasopiśmie
Brak miniatury
Licencja

ClosedAccessDostęp zamknięty
 

Heteroepitaxial Growth of High Optical Quality, Wafer-Scale van der Waals Heterostrucutres

Uproszczony widok
cris.lastimport.scopus2024-02-12T20:08:19Z
dc.abstract.enTransition metal dichalcogenides (TMDs) are materials that can exhibit intriguing optical properties like a change of the bandgap from indirect to direct when being thinned down to a monolayer. Well-resolved narrow excitonic resonances can be observed for such monolayers although only for materials of sufficient crystalline quality and so far mostly available in the form of micrometer-sized flakes. A further significant improvement of optical and electrical properties can be achieved by transferring the TMD on hexagonal boron nitride (hBN). To exploit the full potential of TMDs in future applications, epitaxial techniques have to be developed that not only allow the growth of large-scale, high-quality TMD monolayers but also allow the growth to be performed directly on large-scale epitaxial hBN. In this work, we address this problem and demonstrate that MoSe2 of high optical quality can be directly grown on epitaxial hBN on an entire 2 in. wafer. We developed a combined growth theme for which hBN is first synthesized at high temperature by metal organic vapor phase epitaxy (MOVPE) and as a second step MoSe2 is deposited on top by molecular beam epitaxy (MBE) at much lower temperatures. We show that this structure exhibits excellent optical properties, manifested by narrow excitonic lines in the photoluminescence spectra. Moreover, the material is homogeneous on the area of the whole 2 in. wafer with only ±0.14 meV deviation of excitonic energy. Our mixed growth technique may guide the way for future large-scale production of high quality TMD/hBN heterostructures.
dc.affiliationUniwersytet Warszawski
dc.contributor.authorBinder, Johannes
dc.contributor.authorStępniewski, Roman
dc.contributor.authorTokarczyk, Mateusz
dc.contributor.authorPacuski, Wojciech
dc.contributor.authorWysmołek, Andrzej
dc.contributor.authorDa̧browska, Aleksandra Krystyna
dc.contributor.authorKowalski, Grzegorz
dc.contributor.authorLudwiczak, Katarzyna
dc.contributor.authorBożek, Rafał
dc.contributor.authorIwański, Jakub
dc.contributor.authorTurczyński, Jakub
dc.contributor.authorKurowska, Bogusława
dc.date.accessioned2024-01-25T03:07:56Z
dc.date.available2024-01-25T03:07:56Z
dc.date.issued2021
dc.description.financePublikacja bezkosztowa
dc.description.number40
dc.description.volume13
dc.identifier.doi10.1021/ACSAMI.1C11867
dc.identifier.issn1944-8244
dc.identifier.urihttps://repozytorium.uw.edu.pl//handle/item/108409
dc.identifier.weblinkhttps://pubs.acs.org/doi/pdf/10.1021/acsami.1c11867
dc.languageeng
dc.pbn.affiliationphysical sciences
dc.relation.ispartofACS Applied Materials & Interfaces
dc.relation.pages47904-47911
dc.rightsClosedAccess
dc.sciencecloudnosend
dc.subject.enlayered materials
dc.subject.entransition metal dichalcogenides
dc.subject.enepitaxy
dc.subject.enmetalorganic vapor phase epitaxy
dc.subject.enmolecular beam epitaxy
dc.subject.enRaman spectroscopy
dc.titleHeteroepitaxial Growth of High Optical Quality, Wafer-Scale van der Waals Heterostrucutres
dc.typeJournalArticle
dspace.entity.typePublication