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Uniqueness of Chinese patenting patterns: the case of graphene

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cris.lastimport.scopus2024-02-12T19:35:36Z
dc.abstract.enThe article compares patenting patterns in China with the United States, South Korea, Japan and Europe, using the case of graphene, 2011–2015. It aims to reveal unique features of patenting in China and identify patent descriptors, diverging from international tendencies and relevant for economic modelling. Hypotheses rely on variables such as: counts of inventors, applicants, technology classes, countries selected for international patenting and geographical origins of patent citations. The research uses quantitative techniques (descriptive statistics, ANOVA, Jaccard index and social network metrics). Using multiple analytical perspectives, the study demonstrates the specificity of Chinese patents and their limited comparability with documents from other patent offices. This has important implications for the development of economic models, which need to take into account the identified incommensurability in cross-country patent data and avoid direct comparisons of data from China and other patent systems owing to the unique features and functions of patents in China.
dc.affiliationUniwersytet Warszawski
dc.contributor.authorKlincewicz, Krzysztof
dc.date.accessioned2024-01-26T11:19:32Z
dc.date.available2024-01-26T11:19:32Z
dc.date.issued2020
dc.description.financePublikacja bezkosztowa
dc.description.number3
dc.description.volume28
dc.identifier.doi10.1080/19761597.2020.1762232
dc.identifier.issn1976-1597
dc.identifier.urihttps://repozytorium.uw.edu.pl//handle/item/124213
dc.identifier.weblinkhttps://www.tandfonline.com/doi/abs/10.1080/19761597.2020.1762232?journalCode=rajt20
dc.languageeng
dc.pbn.affiliationeconomics and finance
dc.relation.ispartofAsian Journal of Technology Innovation
dc.relation.pages377-402
dc.rightsClosedAccess
dc.sciencecloudnosend
dc.subject.enChina
dc.subject.engraphene
dc.subject.eninternational comparison
dc.subject.eninnovation
dc.subject.enpatents
dc.titleUniqueness of Chinese patenting patterns: the case of graphene
dc.typeJournalArticle
dspace.entity.typePublication